Es gibt Saphirwafer und -substrate mit verschiedenen Spezifikationen in unterschiedlichen Kristallrichtungen, Dicken und Anforderungen an die Verarbeitungsgenauigkeit. Hauptsächlich Saphirwaferprodukte sind 2'', 4'' und 6'' Saphirwafer. Anpassung ist verfügbar.
Applications including but not limited to:
Microelectronic IC applications
SOS Silicon-on-Sapphire
The growth of superconducting compounds / Gallium Nitride
Infrared detectors
Hybrid microelectronics
Polishing carriers
Hostile environment
Optical transmission from ultraviolet to near infrared
High temperature
Radiation resistance
Specification
Crystal Material | ≥ 99.995% Al2O3, High Purity |
Diameter | Ø2" 50.8mm, Ø 3" 76.2mm, Ø 4" 100mm, Ø 6" 150mm etc |
Thickness | 430um (Ø 2"), 430/600um (Ø 3"), 650/600 um (Ø 4"), 1000/1300um (Ø 6"),or other customized thickness available |
Surface finish | One side polished (SSP), Double sided polished (DSP) |
Surface Roughness | Epi-ready CMP Ra ≤ 0.3nm (polished side) |
TTV/WARP/BOW | ≤10um/ 10um/ 10um |
Packing | Class 100 Clean room cleaning and vacuum packaging |
